Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures

Angeles Marcia Almanza-Workman; Srini Raghavan; Pierre Deymier; David J. Monk; Ray Roop

doi:10.4028/www.scientific.net/SSP.76-77.23

Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures

Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, David J. Monk, Ray Roop

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Ultra Clean Processing of Silicon Surfaces 2000
Editors	Marc Heyns, Paul Mertens, Marc Meuris
Publisher	Trans Tech Publications Ltd
Pages	23-26
Number of pages	4
ISBN (Print)	9783908450573
DOIs	https://doi.org/10.4028/www.scientific.net/SSP.76-77.23
State	Published - 2001
Event	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium Duration: Sep 18 2000 → Sep 20 2000

Publication series

Name	Solid State Phenomena
Volume	76-77
ISSN (Print)	1012-0394
ISSN (Electronic)	1662-9779

Other

Other	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
Country/Territory	Belgium
City	Ostend
Period	9/18/00 → 9/20/00

Keywords

Polysilicon
Self-Assembled monolayers
Stiction
Water dispersible silanes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Materials Science(all)
Condensed Matter Physics

Access to Document

10.4028/www.scientific.net/SSP.76-77.23

Cite this

Almanza-Workman, A. M., Raghavan, S., Deymier, P., Monk, D. J., & Roop, R. (2001). Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 23-26). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.76-77.23

Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. / Almanza-Workman, Angeles Marcia; Raghavan, Srini; Deymier, Pierre; Monk, David J.; Roop, Ray.

Ultra Clean Processing of Silicon Surfaces 2000. ed. / Marc Heyns; Paul Mertens; Marc Meuris. Trans Tech Publications Ltd, 2001. p. 23-26 (Solid State Phenomena; Vol. 76-77).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Almanza-Workman, AM, Raghavan, S, Deymier, P, Monk, DJ & Roop, R 2001, Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. in M Heyns, P Mertens & M Meuris (eds), Ultra Clean Processing of Silicon Surfaces 2000. Solid State Phenomena, vol. 76-77, Trans Tech Publications Ltd, pp. 23-26, 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000, Ostend, Belgium, 9/18/00. https://doi.org/10.4028/www.scientific.net/SSP.76-77.23

Almanza-Workman AM, Raghavan S, Deymier P, Monk DJ, Roop R. Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. In Heyns M, Mertens P, Meuris M, editors, Ultra Clean Processing of Silicon Surfaces 2000. Trans Tech Publications Ltd. 2001. p. 23-26. (Solid State Phenomena). https://doi.org/10.4028/www.scientific.net/SSP.76-77.23

Almanza-Workman, Angeles Marcia ; Raghavan, Srini ; Deymier, Pierre ; Monk, David J. ; Roop, Ray. / Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. Ultra Clean Processing of Silicon Surfaces 2000. editor / Marc Heyns ; Paul Mertens ; Marc Meuris. Trans Tech Publications Ltd, 2001. pp. 23-26 (Solid State Phenomena).

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keywords = "Polysilicon, Self-Assembled monolayers, Stiction, Water dispersible silanes",

author = "Almanza-Workman, {Angeles Marcia} and Srini Raghavan and Pierre Deymier and Monk, {David J.} and Ray Roop",

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Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures

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Keywords

ASJC Scopus subject areas

Access to Document

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