Abstract
We report 1.3 μm distributed Bragg reflector (DBR) lasers with a hybrid growth employing base wafers grown by chemical beam epitaxy (CBE), and Fe-doped InP lateral current blocking grown by metal-organic chemical vapour deposition (MOCVD). These lasers display exceptional wavelength uniformity (a ~ 2.7 Å) across the wafer, and suggest that DBR lasers and vapour/beam growth techniques may be suitable for advanced WDM applications.
Original language | English (US) |
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Pages (from-to) | 822-824 |
Number of pages | 3 |
Journal | Electronics Letters |
Volume | 24 |
Issue number | 13 |
DOIs | |
State | Published - 1988 |
Externally published | Yes |
Keywords
- Epitaxy
- Semiconductor lasers
ASJC Scopus subject areas
- Electrical and Electronic Engineering