Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

N. R. Armstrong; J. R. White

doi:10.1016/0022-0728(82)87065-4

Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

N. R. Armstrong, J. R. White

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 10¹⁵/cm ²) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

Original language	English (US)
Pages (from-to)	121-136
Number of pages	16
Journal	Journal of Electroanalytical Chemistry
Volume	131
Issue number	C
DOIs	https://doi.org/10.1016/0022-0728(82)87065-4
State	Published - Jan 8 1982
Externally published	Yes

ASJC Scopus subject areas

Analytical Chemistry
General Chemical Engineering
Electrochemistry

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10.1016/0022-0728(82)87065-4

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title = "Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas",

abstract = "Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.",

author = "Armstrong, {N. R.} and White, {J. R.}",

note = "Funding Information: This research was supported in part by a grant from the National Science Foundation, CHE W-17571, and-by a grant from the Sierracin Corporation. The authors would like to acknowledge the assistance of Roy Railer in acquisition and analysis of the .X-ray photoelectron spectroscopic data.",

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doi = "10.1016/0022-0728(82)87065-4",

language = "English (US)",

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journal = "Journal of Electroanalytical Chemistry",

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T1 - Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

AU - Armstrong, N. R.

AU - White, J. R.

N1 - Funding Information: This research was supported in part by a grant from the National Science Foundation, CHE W-17571, and-by a grant from the Sierracin Corporation. The authors would like to acknowledge the assistance of Roy Railer in acquisition and analysis of the .X-ray photoelectron spectroscopic data.

PY - 1982/1/8

Y1 - 1982/1/8

N2 - Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

AB - Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 1015/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide-in a fashion not seen for bulk gold or other gold films.

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Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

Abstract

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