@inproceedings{33c283ed753f4faeb82bef8eaffa9dda,
title = "Using ion implantation for figure correction in glass and silicon mirror substrates for X-ray telescopes",
abstract = "Ion implantation is a method of correcting figure errors in thin silicon or glass substrates. For future high-resolution, highthroughput X-ray observatories, such figure correction may be critical for thin mirror substrates. Ion implantation into both glass and silicon results in surface stress, which bends the substrate. We demonstrate that this stress may be used to improve the surface figure of flat glass wafers. We then describe three effects of ion implantation in glass and silicon. The first effect is the stress resulting from the implanted ions, and the implications for figure correction with each material. Second, each material studied also shows some relaxation after the ion beam is removed; we report on the magnitude of this relaxation and its implications. Finally, the surface stress may affect the strength of implanted materials. We report on ring-on-ring strength tests conducted on implanted glass samples.",
keywords = "X-Ray telescope mirrors, figure correction, glass, ion implantation, silicon",
author = "Brandon Chalifoux and Claire Burch and Heilmann, {Ralf K.} and Youwei Yao and Zuo, {Heng E.} and Schattenburg, {Mark L.}",
note = "Funding Information: The authors would like to thank Will Zhang and the NGXO group at NASA Goddard Space Flight Center (GSFC), and Lester Cohen at Smithsonian Astrophysics Observatory (SAO) for helpful discussions. This work was financially supported by the NASA APRA grant NNX14AE76G, the MIT Kavli Institute Research Investment Fund, and the National Science Foundation Graduate Research Fellowship Program. Publisher Copyright: {\textcopyright} 2017 SPIE.; Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII 2017 ; Conference date: 08-08-2017 Through 10-08-2017",
year = "2017",
doi = "10.1117/12.2275324",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "O'Dell, {Stephen L.} and Giovanni Pareschi",
booktitle = "Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII",
}