Ultraviolet light imprinted sol-gel silica glass waveguide devices on silicon

P. Coudray; J. Chisham; A. Malek-Tabrizi; C. Y. Li; M. P. Andrews; N. Peyghambarian; S. I. Najafi

doi:10.1016/0030-4018(96)00101-0

Ultraviolet light imprinted sol-gel silica glass waveguide devices on silicon

P. Coudray, J. Chisham, A. Malek-Tabrizi, C. Y. Li, M. P. Andrews, N. Peyghambarian, S. I. Najafi

Research output: Contribution to journal › Article › peer-review

51 Scopus citations

Abstract

We describe a new simplified process for inexpensive fabrication of low-loss (0.1 dB/cm) glass waveguides on silicon by ultraviolet light imprinting in photosensitive, organically modified sol-gel silica glass films prepared by one-step dip-coating process. The fabrication process is appealing because the buffer layer between waveguide and substrate is eliminated, and waveguides can be made in a few steps using low-cost equipment. Also, a 1 × 8 power splitter is produced by this process. The splitter exhibits relatively uniform output and a configuration loss of 0.9 dB at 1.55 μm wavelength.

Original language	English (US)
Pages (from-to)	19-22
Number of pages	4
Journal	Optics Communications
Volume	128
Issue number	1-3
DOIs	https://doi.org/10.1016/0030-4018(96)00101-0
State	Published - Jul 1 1996

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry
Electrical and Electronic Engineering

Access to Document

10.1016/0030-4018(96)00101-0

Cite this

@article{df3fca12eb004a06bc7eb638dffac579,

title = "Ultraviolet light imprinted sol-gel silica glass waveguide devices on silicon",

abstract = "We describe a new simplified process for inexpensive fabrication of low-loss (0.1 dB/cm) glass waveguides on silicon by ultraviolet light imprinting in photosensitive, organically modified sol-gel silica glass films prepared by one-step dip-coating process. The fabrication process is appealing because the buffer layer between waveguide and substrate is eliminated, and waveguides can be made in a few steps using low-cost equipment. Also, a 1 × 8 power splitter is produced by this process. The splitter exhibits relatively uniform output and a configuration loss of 0.9 dB at 1.55 μm wavelength.",

author = "P. Coudray and J. Chisham and A. Malek-Tabrizi and Li, {C. Y.} and Andrews, {M. P.} and N. Peyghambarian and Najafi, {S. I.}",

note = "Funding Information: This work was fundedi n partb y researchg rants from Natural Sciencesa nd EngineeringR esearch Council of Canada (NSERC), FCAR, AFOSR-BMDO, NSF and ARO. J. Chishamt hanksM cGill Universityf or a Max StemS cholarship.",

year = "1996",

month = jul,

day = "1",

doi = "10.1016/0030-4018(96)00101-0",

language = "English (US)",

volume = "128",

pages = "19--22",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - Ultraviolet light imprinted sol-gel silica glass waveguide devices on silicon

AU - Coudray, P.

AU - Chisham, J.

AU - Malek-Tabrizi, A.

AU - Li, C. Y.

AU - Andrews, M. P.

AU - Peyghambarian, N.

AU - Najafi, S. I.

N1 - Funding Information: This work was fundedi n partb y researchg rants from Natural Sciencesa nd EngineeringR esearch Council of Canada (NSERC), FCAR, AFOSR-BMDO, NSF and ARO. J. Chishamt hanksM cGill Universityf or a Max StemS cholarship.

PY - 1996/7/1

Y1 - 1996/7/1

N2 - We describe a new simplified process for inexpensive fabrication of low-loss (0.1 dB/cm) glass waveguides on silicon by ultraviolet light imprinting in photosensitive, organically modified sol-gel silica glass films prepared by one-step dip-coating process. The fabrication process is appealing because the buffer layer between waveguide and substrate is eliminated, and waveguides can be made in a few steps using low-cost equipment. Also, a 1 × 8 power splitter is produced by this process. The splitter exhibits relatively uniform output and a configuration loss of 0.9 dB at 1.55 μm wavelength.

AB - We describe a new simplified process for inexpensive fabrication of low-loss (0.1 dB/cm) glass waveguides on silicon by ultraviolet light imprinting in photosensitive, organically modified sol-gel silica glass films prepared by one-step dip-coating process. The fabrication process is appealing because the buffer layer between waveguide and substrate is eliminated, and waveguides can be made in a few steps using low-cost equipment. Also, a 1 × 8 power splitter is produced by this process. The splitter exhibits relatively uniform output and a configuration loss of 0.9 dB at 1.55 μm wavelength.

UR - http://www.scopus.com/inward/record.url?scp=0030191177&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030191177&partnerID=8YFLogxK

U2 - 10.1016/0030-4018(96)00101-0

DO - 10.1016/0030-4018(96)00101-0

M3 - Article

AN - SCOPUS:0030191177

SN - 0030-4018

VL - 128

SP - 19

EP - 22

JO - Optics Communications

JF - Optics Communications

IS - 1-3

ER -

Ultraviolet light imprinted sol-gel silica glass waveguide devices on silicon

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this