Two-dimensional stitching interferometry for self-calibration of high-order additive systematic errors

Lei Huang, Tianyi Wang, Josep Nicolas, Amparo Vivo, François Polack, Muriel Thomasset, Chao Zuo, Kashmira Tayabaly, Dae Wook Kim, Mourad Idir

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Stitching interferometry is performed by collecting interferometric data from overlapped sub-apertures and stitching these data together to provide a full surface map. The propagation of the systematic error in the measured subset data is one of the main error sources in stitching interferometry for accurate reconstruction of the surface topography. In this work, we propose, using the redundancy of the captured subset data, two types of two-dimensional (2D) self-calibration stitching algorithms to overcome this issue by in situ estimating the repeatable high-order additive systematic errors, especially for the application of measuring X-ray mirrors. The first algorithm, called CS short for “Calibrate, and then Stitch”, calibrates the high-order terms of the reference by minimizing the de-tilted discrepancies of the overlapped subsets and then stitches the reference-subtracted subsets. The second algorithm, called SC short for “Stitch, and then Calibrate”, stitches a temporarily result and then calibrates the reference from the de-tilted discrepancies of the measured subsets and the temporarily stitched result. In the implementation of 2D scans in x- and y-directions, step randomization is introduced to generate nonuniformly spaced subsets which can diminish the periodic stitching errors commonly observed in evenly spaced subsets. The regularization on low-order terms enables a highly flexible option to add the curvature and twist acquired by another system. Both numerical simulations and experiments are carried out to verify the proposed method. All the results indicate that 2D high-order repeatable additive systematic errors can be retrieved from the 2D redundant overlapped data in stitching interferometry.

Original languageEnglish (US)
Pages (from-to)26940-26956
Number of pages17
JournalOptics Express
Volume27
Issue number19
DOIs
StatePublished - Sep 16 2019

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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