Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

Xiaomin Wei; Yun Zhuang; Yasa Sampurno; Fransisca Sudargho; Christopher Wargo; Leonard Borucki; Ara Philipossian

doi:10.1149/1.3483752

Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

Xiaomin Wei, Yun Zhuang, Yasa Sampurno, Fransisca Sudargho, Christopher Wargo, Leonard Borucki, Ara Philipossian

Chemical and Environmental Engineering

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.

Original language	English (US)
Pages (from-to)	H391-H395
Journal	Electrochemical and Solid-State Letters
Volume	13
Issue number	11
DOIs	https://doi.org/10.1149/1.3483752
State	Published - 2010

ASJC Scopus subject areas

General Chemical Engineering
General Materials Science
Physical and Theoretical Chemistry
Electrochemistry
Electrical and Electronic Engineering

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title = "Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP",

abstract = "Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.",

author = "Xiaomin Wei and Yun Zhuang and Yasa Sampurno and Fransisca Sudargho and Christopher Wargo and Leonard Borucki and Ara Philipossian",

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T1 - Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

AU - Wei, Xiaomin

AU - Zhuang, Yun

AU - Sampurno, Yasa

AU - Sudargho, Fransisca

AU - Wargo, Christopher

AU - Borucki, Leonard

AU - Philipossian, Ara

PY - 2010

Y1 - 2010

N2 - Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.

AB - Retaining rings made of poly(phenylene sulfide) (PPS) and polyetheretherketone (PEEK) with two different slot designs were subjected to a 4 h wear test. During the chemical mechanical planarization (CMP) process, the PPS retaining ring induced a higher coefficient of friction (COF) by ∼0.1 than the PEEK retaining rings. In addition, the PPS retaining ring exhibited a higher wear rate than the PEEK retaining rings by ∼28%. Although the retaining ring slot design did not significantly affect the COF and wear rate, retaining rings with sharp slot edges resulted in higher pad surface abruptness.

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Tribological, thermal, and wear characteristics of poly(phenylene sulfide) and polyetheretherketone retaining rings in interlayer dielectric CMP

Abstract

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