@inproceedings{9030ba17c7bb4a4a86e0d025232cdf58,
title = "Tribological characterization of anionic supramolecular assemblies in post-sti-cmp cleaning solution using a novel post-cmp pva brush scrubber",
abstract = "We have shown how different micellar (SDBS) vs. polyelectrolytic (PSSA) supramolecular assemblies in post-CMP cleaning solutions differ in their tribological performance when used in a novel PVA scrubber for 300-mm silicon dioxide wafer cleaning. Significant differences in real-time shear force and coefficient of friction data from the wafer-solution-brush interface (both in time domain as well as frequency domain) have been attributed to differences in each supramolecule{\textquoteright}s chemical functionality and structure, which in turn, have been correlated to wafer-level defects. The work has underscored the importance of measuring the tribological attributes of post-CMP cleaning processes in an effort to improve cleaning performance.",
keywords = "Brush, Coefficient of friction, Micelle, PVA, Polyelectrolyte, Post-CMP cleaning, Scrubbing, Shear force, Supramolecular assemblies",
author = "Ara Philipossian and Yasa Sampurno and Sian Theng and Fransisca Sudargho and Katherine Wortman-Otto and Carolyn Graverson and Jason Keleher",
note = "Publisher Copyright: {\textcopyright} 2021 Trans Tech Publications Ltd, Switzerland.; 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 ; Conference date: 12-04-2021 Through 15-04-2021",
year = "2021",
doi = "10.4028/www.scientific.net/SSP.314.264",
language = "English (US)",
isbn = "9783035738018",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "264--269",
editor = "Mertens, {Paul W.} and Kurt Wostyn and Marc Meuris and Marc Heyns",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021",
}