Transmission of light through slit apertures in metallic films

Masud Mansuripur; Yong Xie; Armis R. Zakharian; Jerome V. Moloney

doi:10.1109/TMAG.2004.842048

Transmission of light through slit apertures in metallic films

Masud Mansuripur, Yong Xie, Armis R. Zakharian, Jerome V. Moloney

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E_∥ and a strong transmission (with no cutoff) for E_⊥, where ∥ and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one half of one wavelength.

Original language	English (US)
Pages (from-to)	1012-1015
Number of pages	4
Journal	IEEE Transactions on Magnetics
Volume	41
Issue number	2
DOIs	https://doi.org/10.1109/TMAG.2004.842048
State	Published - Feb 2005

Keywords

Diffraction
Electromagnetic scattering
Optics

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/TMAG.2004.842048

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title = "Transmission of light through slit apertures in metallic films",

abstract = "Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E∥ and a strong transmission (with no cutoff) for E⊥, where ∥ and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one half of one wavelength.",

keywords = "Diffraction, Electromagnetic scattering, Optics",

author = "Masud Mansuripur and Yong Xie and Zakharian, \{Armis R.\} and Moloney, \{Jerome V.\}",

note = "Funding Information: Manuscript received September 9, 2004. This work was supported in part by the Air Force Office of Scientific Research under Contract F49620-03-0194 and in part by the National Science Foundation under Contract DMS 0335101.",

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doi = "10.1109/TMAG.2004.842048",

language = "English (US)",

volume = "41",

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publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - Transmission of light through slit apertures in metallic films

AU - Mansuripur, Masud

AU - Xie, Yong

AU - Zakharian, Armis R.

AU - Moloney, Jerome V.

N1 - Funding Information: Manuscript received September 9, 2004. This work was supported in part by the Air Force Office of Scientific Research under Contract F49620-03-0194 and in part by the National Science Foundation under Contract DMS 0335101.

PY - 2005/2

Y1 - 2005/2

N2 - Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E∥ and a strong transmission (with no cutoff) for E⊥, where ∥ and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one half of one wavelength.

AB - Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E∥ and a strong transmission (with no cutoff) for E⊥, where ∥ and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one half of one wavelength.

KW - Diffraction

KW - Electromagnetic scattering

KW - Optics

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Transmission of light through slit apertures in metallic films

Abstract

Keywords

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