Transmission of light through slit apertures in metallic films

Masud Mansuripur, Yong Xie, Armis R. Zakharian, Jerome V. Moloney

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E and a strong transmission (with no cutoff) for E, where ∥ and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one half of one wavelength.

Original languageEnglish (US)
Pages (from-to)1012-1015
Number of pages4
JournalIEEE Transactions on Magnetics
Issue number2
StatePublished - Feb 2005


  • Diffraction
  • Electromagnetic scattering
  • Optics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


Dive into the research topics of 'Transmission of light through slit apertures in metallic films'. Together they form a unique fingerprint.

Cite this