Through-focus scanning re-radiance simulation for semiconductor inspection system development

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, we present a through-focus re-radiation simulation aimed at detecting scattering from semiconductor structures. We employ the beam synthesis propagation (BSP) module within the finite-difference time-domain (FDTD) method, optimizing the simulation of optical systems by reducing time and computational resources typically required for imaging and illumination. To validate the approach, we simulated scattering from Silicon nitride (Si3N4) lines on a silicon (Si) substrate with various defect sizes and types at a 193 nm wavelength. The results demonstrated the detection of specific defect signals and identified the limitations of detectable defect sizes. These findings are intended to serve as pre-processing data for predicting outcomes in through-focus scanning optical microscopy (TSOM) imaging.

Original languageEnglish (US)
Pages (from-to)381-386
Number of pages6
JournalOptical Review
Volume32
Issue number2
DOIs
StatePublished - Apr 2025

Keywords

  • Defect analysis
  • Nanometrology
  • Optical microscope
  • TSOM
  • Through focus

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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