Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


The thermal stability of photo-imprinted Bragg gratings formed in reactive-atmosphere, RF-magnetron sputtered germanosilicate thin films was evaluated in terms of point defect modifications observed during isochronal annealing. Optical and magnetic spectroscopies were utilized to evaluate structural relaxation in these sputtered glasses on both the local and medium-range size scale. Depending upon the substrate temperature used during deposition, significant structural rearrangement was found to occur with increasing post-deposition anneal temperature to 600 °C. This resulted in changes in the photobleaching response of the material itself as the identity of optically active structural defects evolved. Based on a color center model for photosensitivity in these materials and measured changes in optical absorption with annealing, the thermal stability of a photo-imprinted Bragg grating was modeled. Good qualitative agreement with experiment was observed.

Original languageEnglish (US)
Pages (from-to)114-126
Number of pages13
JournalJournal of Non-Crystalline Solids
Issue number2-3
StatePublished - Nov 2000
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry


Dive into the research topics of 'Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass'. Together they form a unique fingerprint.

Cite this