Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass

B. G. Potter; K. Simmons-Potter; T. D. Dunbar

doi:10.1016/S0022-3093(00)00305-7

Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass

B. G. Potter, K. Simmons-Potter, T. D. Dunbar

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The thermal stability of photo-imprinted Bragg gratings formed in reactive-atmosphere, RF-magnetron sputtered germanosilicate thin films was evaluated in terms of point defect modifications observed during isochronal annealing. Optical and magnetic spectroscopies were utilized to evaluate structural relaxation in these sputtered glasses on both the local and medium-range size scale. Depending upon the substrate temperature used during deposition, significant structural rearrangement was found to occur with increasing post-deposition anneal temperature to 600 °C. This resulted in changes in the photobleaching response of the material itself as the identity of optically active structural defects evolved. Based on a color center model for photosensitivity in these materials and measured changes in optical absorption with annealing, the thermal stability of a photo-imprinted Bragg grating was modeled. Good qualitative agreement with experiment was observed.

Original language	English (US)
Pages (from-to)	114-126
Number of pages	13
Journal	Journal of Non-Crystalline Solids
Volume	277
Issue number	2-3
DOIs	https://doi.org/10.1016/S0022-3093(00)00305-7
State	Published - Nov 2000
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/S0022-3093(00)00305-7

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title = "Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass",

abstract = "The thermal stability of photo-imprinted Bragg gratings formed in reactive-atmosphere, RF-magnetron sputtered germanosilicate thin films was evaluated in terms of point defect modifications observed during isochronal annealing. Optical and magnetic spectroscopies were utilized to evaluate structural relaxation in these sputtered glasses on both the local and medium-range size scale. Depending upon the substrate temperature used during deposition, significant structural rearrangement was found to occur with increasing post-deposition anneal temperature to 600 °C. This resulted in changes in the photobleaching response of the material itself as the identity of optically active structural defects evolved. Based on a color center model for photosensitivity in these materials and measured changes in optical absorption with annealing, the thermal stability of a photo-imprinted Bragg grating was modeled. Good qualitative agreement with experiment was observed.",

author = "Potter, {B. G.} and K. Simmons-Potter and Dunbar, {T. D.}",

note = "Funding Information: Sandia National Laboratories is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company. This work was supported by the US DOE under contract DE-AC04-94AL85000.",

year = "2000",

month = nov,

doi = "10.1016/S0022-3093(00)00305-7",

language = "English (US)",

volume = "277",

pages = "114--126",

journal = "Journal of Non-Crystalline Solids",

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publisher = "Elsevier B.V.",

number = "2-3",

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T1 - Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass

AU - Potter, B. G.

AU - Simmons-Potter, K.

AU - Dunbar, T. D.

N1 - Funding Information: Sandia National Laboratories is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company. This work was supported by the US DOE under contract DE-AC04-94AL85000.

PY - 2000/11

Y1 - 2000/11

N2 - The thermal stability of photo-imprinted Bragg gratings formed in reactive-atmosphere, RF-magnetron sputtered germanosilicate thin films was evaluated in terms of point defect modifications observed during isochronal annealing. Optical and magnetic spectroscopies were utilized to evaluate structural relaxation in these sputtered glasses on both the local and medium-range size scale. Depending upon the substrate temperature used during deposition, significant structural rearrangement was found to occur with increasing post-deposition anneal temperature to 600 °C. This resulted in changes in the photobleaching response of the material itself as the identity of optically active structural defects evolved. Based on a color center model for photosensitivity in these materials and measured changes in optical absorption with annealing, the thermal stability of a photo-imprinted Bragg grating was modeled. Good qualitative agreement with experiment was observed.

AB - The thermal stability of photo-imprinted Bragg gratings formed in reactive-atmosphere, RF-magnetron sputtered germanosilicate thin films was evaluated in terms of point defect modifications observed during isochronal annealing. Optical and magnetic spectroscopies were utilized to evaluate structural relaxation in these sputtered glasses on both the local and medium-range size scale. Depending upon the substrate temperature used during deposition, significant structural rearrangement was found to occur with increasing post-deposition anneal temperature to 600 °C. This resulted in changes in the photobleaching response of the material itself as the identity of optically active structural defects evolved. Based on a color center model for photosensitivity in these materials and measured changes in optical absorption with annealing, the thermal stability of a photo-imprinted Bragg grating was modeled. Good qualitative agreement with experiment was observed.

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JF - Journal of Non-Crystalline Solids

IS - 2-3

ER -

Thermal stability of photosensitive Bragg gratings in sputter-deposited germanosilicate glass

Abstract

ASJC Scopus subject areas

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