Abstract
A description is given of a modeling technique that is used to explore three-dimensional image distributions formed by high numerical aperture (NA > 0.6) lenses in homogeneous, isotropic, linear, and source-free thin films. The approach is based on a plane-wave decomposition in the exit pupil. Factors that are due to polarization, aberration, object transmittance, propagation, and phase terms are associated with each planewave component. These are combined with a modified thin-film matrix technique in a derivation of the total field amplitude at each point in the film by a coherent vector sum over all plane waves. One then calculates the image distribution by squaring the electric-field amplitude. The model is used to show how asymmetries present in the polarized image change with the influence of a thin film. Extensions of the model to magneto-optic thin films are discussed.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 53-64 |
| Number of pages | 12 |
| Journal | Journal of the Optical Society of America A: Optics and Image Science, and Vision |
| Volume | 13 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jan 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Computer Vision and Pattern Recognition