Synthesis and Characterization of Lead Chevrel Phase Thin Films for Hydrodesulfurization Catalysis

Irmgard M. Schewe-Miller; Kwan Felix Koo; Michael Columbia; Fan Li; Glenn L. Schrader

doi:10.1021/cm00048a019

Synthesis and Characterization of Lead Chevrel Phase Thin Films for Hydrodesulfurization Catalysis

Irmgard M. Schewe-Miller, Kwan Felix Koo, Michael Columbia, Fan Li, Glenn L. Schrader

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Reactive sputtering has been used to prepare the lead Chevrel phase PbMo₆S₈ on several substrates. The effect of processing parameters such as H₂S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo₆S₈ from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800 °C), compared to conventional solid-state preparations (1000 °C). The thin films of PbMo₆S₈ were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS₂ could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

Original language	English (US)
Pages (from-to)	2327-2335
Number of pages	9
Journal	Chemistry of Materials
Volume	6
Issue number	12
DOIs	https://doi.org/10.1021/cm00048a019
State	Published - Dec 1 1994
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

Access to Document

10.1021/cm00048a019

Cite this

@article{f26f69fa14814732a25e08f0deecac7f,

title = "Synthesis and Characterization of Lead Chevrel Phase Thin Films for Hydrodesulfurization Catalysis",

abstract = "Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800 °C), compared to conventional solid-state preparations (1000 °C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.",

author = "Schewe-Miller, {Irmgard M.} and Koo, {Kwan Felix} and Michael Columbia and Fan Li and Schrader, {Glenn L.}",

year = "1994",

month = dec,

day = "1",

doi = "10.1021/cm00048a019",

language = "English (US)",

volume = "6",

pages = "2327--2335",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "12",

}

TY - JOUR

T1 - Synthesis and Characterization of Lead Chevrel Phase Thin Films for Hydrodesulfurization Catalysis

AU - Schewe-Miller, Irmgard M.

AU - Koo, Kwan Felix

AU - Columbia, Michael

AU - Li, Fan

AU - Schrader, Glenn L.

PY - 1994/12/1

Y1 - 1994/12/1

N2 - Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800 °C), compared to conventional solid-state preparations (1000 °C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

AB - Reactive sputtering has been used to prepare the lead Chevrel phase PbMo6S8 on several substrates. The effect of processing parameters such as H2S flow rate, Pb sputtering current, substrate temperature, and annealing temperature were found to be very important in determining sample purity. Formation of PbMo6S8 from an as-deposited material apparently occurred at significantly lower annealing temperatures (400-800 °C), compared to conventional solid-state preparations (1000 °C). The thin films of PbMo6S8 were active thiophene hydrodesulfurization catalysts: the absence of impurities including MoS2 could be confirmed for these materials, before and after reaction. Because the characteristic catalytic properties of the lead Chevrel phases were observed, reactive sputtering may be applicable for the preparation of other Chevrel phases on catalyst supports.

UR - http://www.scopus.com/inward/record.url?scp=3943083313&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3943083313&partnerID=8YFLogxK

U2 - 10.1021/cm00048a019

DO - 10.1021/cm00048a019

M3 - Article

AN - SCOPUS:3943083313

SN - 0897-4756

VL - 6

SP - 2327

EP - 2335

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 12

ER -

Synthesis and Characterization of Lead Chevrel Phase Thin Films for Hydrodesulfurization Catalysis

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this