Engineering & Materials Science
Atomic layer deposition
100%
Surface reactions
93%
Oxides
42%
Temperature programmed desorption
24%
Monolayers
21%
Temperature
19%
Water vapor
18%
Atoms
16%
Annealing
16%
Titanium
15%
Aluminum oxide
15%
Vacuum
14%
Oxygen
13%
Chemical analysis
10%
Experiments
5%
Physics & Astronomy
atomic layer epitaxy
67%
surface reactions
67%
cycles
43%
tetrachlorides
24%
oxides
20%
mixed oxides
19%
adatoms
16%
water vapor
16%
methylidyne
16%
pulses
16%
temperature
14%
desorption
14%
titanium
13%
vacuum
10%
oxygen
9%
annealing
9%
Chemical Compounds
Atomic Layer Epitaxy
75%
Surface Reaction
68%
Surface
16%
Oxide
14%
Water Vapor
12%
Vacuum
10%
Annealing
10%
Chemical Element
10%
Desorption
10%
Monolayer
9%
Dioxygen
6%