A new technology to pattern surface charges, either negatively or positively, using a standard photolithography process is introduced. A positively charged poly(allylamine hydrochloride) (PAH) layer is coated onto a negatively charged silicon oxide surface by electrostatic self-assembly (ESA). Combined with photolithography in a lift-off-based process, several different surface charge patterns were successfully produced. Due to definition of the pattern by photolithography, no limitations in the pattern geometry exist. Any surface charge pattern can be created to enable fine control of fluid motion in microfluidic devices. Physical properties of this PAH layer were characterized. The generation of a bi-directional shear flow was demonstrated by using alternating longitudinal surface charge pattern with a single driving force, i.e. an externally applied electric field inside a microchannel.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering