Surface and Colloidal Chemical Aspects of Wet Cleaning

Srini Raghavan; Manish Keswani; Nandini Venkataraman

doi:10.1002/9781118071748.ch1

Surface and Colloidal Chemical Aspects of Wet Cleaning

Srini Raghavan, Manish Keswani, Nandini Venkataraman

Research output: Chapter in Book/Report/Conference proceeding › Chapter

1 Scopus citations

Abstract

Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include surface charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorption of surfactants and metal ions on insulating surfaces, principles of surface tension gradient drying, and wetting and penetration of high aspect ratio features.

Original language	English (US)
Title of host publication	Handbook of Cleaning in Semiconductor Manufacturing
Subtitle of host publication	Fundamental and Applications
Publisher	John Wiley and Sons
Pages	3-37
Number of pages	35
ISBN (Print)	9780470625958
DOIs	https://doi.org/10.1002/9781118071748.ch1
State	Published - Feb 22 2011
Externally published	Yes

Keywords

Electrical double layer
High aspect ratio cleaning
Interfacial phenomena
Metal adsorption
Surface charging of metal oxide and nitride
Surface tension gradient drying
Wet cleaning

ASJC Scopus subject areas

Engineering(all)

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10.1002/9781118071748.ch1

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abstract = "Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include surface charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorption of surfactants and metal ions on insulating surfaces, principles of surface tension gradient drying, and wetting and penetration of high aspect ratio features.",

keywords = "Electrical double layer, High aspect ratio cleaning, Interfacial phenomena, Metal adsorption, Surface charging of metal oxide and nitride, Surface tension gradient drying, Wet cleaning",

author = "Srini Raghavan and Manish Keswani and Nandini Venkataraman",

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AU - Keswani, Manish

AU - Venkataraman, Nandini

PY - 2011/2/22

Y1 - 2011/2/22

N2 - Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include surface charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorption of surfactants and metal ions on insulating surfaces, principles of surface tension gradient drying, and wetting and penetration of high aspect ratio features.

AB - Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include surface charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorption of surfactants and metal ions on insulating surfaces, principles of surface tension gradient drying, and wetting and penetration of high aspect ratio features.

KW - Electrical double layer

KW - High aspect ratio cleaning

KW - Interfacial phenomena

KW - Metal adsorption

KW - Surface charging of metal oxide and nitride

KW - Surface tension gradient drying

KW - Wet cleaning

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BT - Handbook of Cleaning in Semiconductor Manufacturing

PB - John Wiley and Sons

ER -

Surface and Colloidal Chemical Aspects of Wet Cleaning

Abstract

Keywords

ASJC Scopus subject areas

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