@inproceedings{ab6a5515e4d649a3845e4db9733a4f1e,
title = "Sulfate adsorption onto and desorption from silicon dioxide films",
abstract = "Sulfate ion adsorption onto and desorption from silicon dioxide surface has been investigated using a quartz crystal microbalance with dissipation monitoring (QCM-D) capability. A viscoelastic model was used to calculate adsorption/desorption amount. The sulfate ion uptake at pH 6.8 varied linearly with sulfate concentration in the range 0.01 M to 0.6 M. Based on the hydrated radius of sulfate ion, the adsorption (uptake) amount indicated multilayer adsorption. The first order rate constant for sulfate desorption with DI water is approximately 0.04 s-1 and 0.12s-1 for flow rates of 0.2 ml/min and 1.0 ml/min, respectively.",
author = "Bing Wu and Srini Raghavan",
note = "Publisher Copyright: {\textcopyright} The Electrochemical Society.; Symposium on Semiconductor Cleaning Science and Technology 14, SCST 2015 - 228th ECS Meeting ; Conference date: 11-10-2015 Through 15-10-2015",
year = "2015",
doi = "10.1149/06908.0045ecst",
language = "English (US)",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "8",
pages = "45--53",
editor = "T. Hattori and Mertens, {P. W.} and Novak, {R. E.} and J. Ruzyllo",
booktitle = "Semiconductor Cleaning Science and Technology 14, SCST 14",
edition = "8",
}