Sub-wavelength printing using multiple overlapping masks

S. Pau; O. Nalamasu; R. Cirelli; J. Frackoviak; A. Timko; G. P. Watson; F. Klemens; G. Timp

doi:10.1016/S0167-9317(00)00277-X

Sub-wavelength printing using multiple overlapping masks

S. Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, G. P. Watson, F. Klemens, G. Timp

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.

Original language	English (US)
Pages (from-to)	119-122
Number of pages	4
Journal	Microelectronic Engineering
Volume	53
Issue number	1
DOIs	https://doi.org/10.1016/S0167-9317(00)00277-X
State	Published - Jun 2000
Externally published	Yes
Event	25th International Conference on Micro- and Nano-Engineering - Rome, Italy Duration: Sep 21 1999 → Sep 23 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(00)00277-X

Cite this

@article{22fdb4a452b744ffb1e55137fee8bb98,

title = "Sub-wavelength printing using multiple overlapping masks",

abstract = "A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.",

author = "S. Pau and O. Nalamasu and R. Cirelli and J. Frackoviak and A. Timko and Watson, {G. P.} and F. Klemens and G. Timp",

year = "2000",

month = jun,

doi = "10.1016/S0167-9317(00)00277-X",

language = "English (US)",

volume = "53",

pages = "119--122",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "1",

note = "25th International Conference on Micro- and Nano-Engineering ; Conference date: 21-09-1999 Through 23-09-1999",

}

TY - JOUR

T1 - Sub-wavelength printing using multiple overlapping masks

AU - Pau, S.

AU - Nalamasu, O.

AU - Cirelli, R.

AU - Frackoviak, J.

AU - Timko, A.

AU - Watson, G. P.

AU - Klemens, F.

AU - Timp, G.

PY - 2000/6

Y1 - 2000/6

N2 - A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.

AB - A multiple exposure technique is used to print various types of patterns with critical dimensions much smaller than the wavelength of light used for exposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the critical dimension of the small feature.

UR - http://www.scopus.com/inward/record.url?scp=0034205301&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034205301&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(00)00277-X

DO - 10.1016/S0167-9317(00)00277-X

M3 - Conference article

AN - SCOPUS:0034205301

SN - 0167-9317

VL - 53

SP - 119

EP - 122

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1

T2 - 25th International Conference on Micro- and Nano-Engineering

Y2 - 21 September 1999 through 23 September 1999

ER -

Sub-wavelength printing using multiple overlapping masks

Abstract

ASJC Scopus subject areas

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