@inbook{373b0a2371ce4b96b63b479622c0f297,
title = "Sub-wavelength Nanopatterning Using Thin Metal Films",
abstract = "Over the decade, photolithography has played a vital role in almost every aspects of modern technology. Developments in this field have allowed researchers to improve the resolution of the conventional photolithographic techniques that is restricted by the optical diffraction limit [1]. However, the implementation of recently developed high resolution lithography techniques beyond the diffraction limit are challenging because of their significant design and layout issues. In this chapter, single-exposure multiple-beams interference lithography generated by thin metal films are demonstrated, which overcome the issues associated with the optical diffraction limit.",
author = "\{K. V\}, Sreekanth and Mohamed ElKabbash and Vincenzo Caligiuri and Ranjan Singh and \{De Luca\}, Antonio and Giuseppe Strangi",
note = "Publisher Copyright: {\textcopyright} 2019, Springer Nature Singapore Pte Ltd.",
year = "2019",
doi = "10.1007/978-981-13-8891-0\_4",
language = "English (US)",
series = "Progress in Optical Science and Photonics",
publisher = "Springer",
pages = "59--78",
booktitle = "Progress in Optical Science and Photonics",
}