Abstract
Force measurements have been conducted between H-terminated Si surface and Si tip in DI-water, NH4OH:H2O (1:100), H2O 2:H2O (1:100) and NH4OH:H2O 2:H2O (1:1:100-1:1:500) solutions as a function of immersion time using atomic force microscopy (AFM). The approach force curve results show attractive forces in DI-water, NH4OH:H2O (1:100) and H2O2:H2O (1:100) solutions at separation distances of less than 10 nm for all immersion times (2, 10 and 60 min) investigated in this study. In the case of dilute ammonia-hydrogen peroxide mixtures, the interaction forces are purely repulsive within 2 min of immersion time. The adhesion forces have also been measured between the surface and the tip in DI-water, NH4OH:H2O (1:100) and H2O 2:H2O (1:100) solutions. The magnitude of the adhesion force is in the range of 0.8-10.5 nN in these solutions. In dilute APM solutions, no adhesion force is measured between the surface and the tip and repulsive forces dominated at all separation distances.
Original language | English (US) |
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Pages (from-to) | 3442-3447 |
Number of pages | 6 |
Journal | Microelectronic Engineering |
Volume | 88 |
Issue number | 12 |
DOIs | |
State | Published - Dec 2011 |
Keywords
- Ammonia-hydrogen peroxide (APM) mixtures
- Contact angle measurements and atomic force microscopy (AFM)
- Interaction forces
- Wafer cleaning
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering