Study of interaction between silicon surfaces in dilute ammonia peroxide mixtures (APM) and their components using atomic force microscope (AFM)

S. Siddiqui, J. Zhang, M. Keswani, A. Fuerst, S. Raghavan

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Force measurements have been conducted between H-terminated Si surface and Si tip in DI-water, NH4OH:H2O (1:100), H2O 2:H2O (1:100) and NH4OH:H2O 2:H2O (1:1:100-1:1:500) solutions as a function of immersion time using atomic force microscopy (AFM). The approach force curve results show attractive forces in DI-water, NH4OH:H2O (1:100) and H2O2:H2O (1:100) solutions at separation distances of less than 10 nm for all immersion times (2, 10 and 60 min) investigated in this study. In the case of dilute ammonia-hydrogen peroxide mixtures, the interaction forces are purely repulsive within 2 min of immersion time. The adhesion forces have also been measured between the surface and the tip in DI-water, NH4OH:H2O (1:100) and H2O 2:H2O (1:100) solutions. The magnitude of the adhesion force is in the range of 0.8-10.5 nN in these solutions. In dilute APM solutions, no adhesion force is measured between the surface and the tip and repulsive forces dominated at all separation distances.

Original languageEnglish (US)
Pages (from-to)3442-3447
Number of pages6
JournalMicroelectronic Engineering
Volume88
Issue number12
DOIs
StatePublished - Dec 2011

Keywords

  • Ammonia-hydrogen peroxide (APM) mixtures
  • Contact angle measurements and atomic force microscopy (AFM)
  • Interaction forces
  • Wafer cleaning

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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