Abstract
As a prototype of the Si - O - Si bonding region for silica modeling, especially the highly flexible Si - O - Si angle deformation, we studied the structure of disiloxane (H3Si - O - SiH3), with ab initio calculations on the SCF, MBPT (2), CCSD, and CCSD(T) levels of theory. The convergence of the results is studied for a series of basis sets of increasing quality. Large basis sets including f functions are necessary to obtain reliable results for the structure and the barrier to linearization of the molecule. The following structure and energy parameters are the results of CCSD(T)-fc/cc-pVTZ calculations: Si - O distance is 1.645Å, the Si - O - Si angle 145.3° and the barrier to linearization 0.48 kcal/mol.
Original language | English (US) |
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Pages (from-to) | 2088-2096 |
Number of pages | 9 |
Journal | International Journal of Quantum Chemistry |
Volume | 108 |
Issue number | 12 SPEC. ISS. |
DOIs | |
State | Published - Oct 2008 |
Keywords
- Ab initio
- Disiloxane
- Post-Hartee-Fock
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Physical and Theoretical Chemistry