Statistical detection of defect patterns using hough transform

Qiang Zhou, Li Zeng, Shiyu Zhou

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Surface defects on semiconductor wafers often exhibit particular spatial patterns. These patterns contain valuable information of the fabrication processes and can help engineers identify the potential root causes. In this paper, we present a control chart technique to detect spatial patterns of surface defects by using the Hough transform. An approximate distribution model of the monitoring statistic is proposed, and a comprehensive control chart design method is developed. This method is characterized by its intuitive implication and a simple design procedure which relates the statistical performance of the control chart to the design parameters. A case study is presented to validate the effectiveness of this method.

Original languageEnglish (US)
Article number5453039
Pages (from-to)370-380
Number of pages11
JournalIEEE Transactions on Semiconductor Manufacturing
Volume23
Issue number3
DOIs
StatePublished - Aug 2010
Externally publishedYes

Keywords

  • Control chart
  • Hough transform (HT)
  • spatial pattern
  • surface quality control

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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