Spot distribution measurement using a scanning nanoslit

Anoop George; Tom D. Milster

doi:10.1364/AO.50.004746

Spot distribution measurement using a scanning nanoslit

Anoop George, Tom D. Milster

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125nm wide and 50 μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.

Original language	English (US)
Pages (from-to)	4746-4754
Number of pages	9
Journal	Applied optics
Volume	50
Issue number	24
DOIs	https://doi.org/10.1364/AO.50.004746
State	Published - Aug 20 2011

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

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10.1364/AO.50.004746

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@article{5a691f4599cd41b993741e498f245a78,

title = "Spot distribution measurement using a scanning nanoslit",

abstract = "A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125nm wide and 50 μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.",

author = "Anoop George and Milster, {Tom D.}",

year = "2011",

month = aug,

day = "20",

doi = "10.1364/AO.50.004746",

language = "English (US)",

volume = "50",

pages = "4746--4754",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "The Optical Society",

number = "24",

}

TY - JOUR

T1 - Spot distribution measurement using a scanning nanoslit

AU - George, Anoop

AU - Milster, Tom D.

PY - 2011/8/20

Y1 - 2011/8/20

N2 - A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125nm wide and 50 μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.

AB - A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125nm wide and 50 μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.

UR - http://www.scopus.com/inward/record.url?scp=80051868064&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80051868064&partnerID=8YFLogxK

U2 - 10.1364/AO.50.004746

DO - 10.1364/AO.50.004746

M3 - Article

C2 - 21857697

AN - SCOPUS:80051868064

VL - 50

SP - 4746

EP - 4754

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

IS - 24

ER -

Spot distribution measurement using a scanning nanoslit

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