@inproceedings{61fa3ac3e93d4cd29ae524c9087d45a0,
title = "Source modeling and calculation of mask irradiance during EUV lithography condenser design",
abstract = "EUV lithography condenser design requires a precise and efficient method for determining uniformity of irradiance on the mask plane. A new methodology is described and results for the method are compared to calculated values.",
author = "Lenny Laughlin and Sasian, {Jose M.}",
note = "Publisher Copyright: {\textcopyright} 2002 OSA - The Optical Society. All rights reserved.; International Optical Design Conference, IODC 2002 ; Conference date: 03-06-2002 Through 05-06-2002",
year = "2002",
language = "English (US)",
series = "Optics InfoBase Conference Papers",
publisher = "Optica Publishing Group (formerly OSA)",
pages = "125",
booktitle = "International Optical Design Conference, IODC 2002",
}