Abstract
The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 455-456 |
| Number of pages | 2 |
| Journal | Electronics Letters |
| Volume | 34 |
| Issue number | 5 |
| DOIs | |
| State | Published - Mar 5 1998 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering