Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

J. T. Rantala; N. Nordman; O. Nordman; J. Vähäkangas; S. Honkanen; N. Peyghambarian

doi:10.1049/el:19980368

Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

J. T. Rantala, N. Nordman, O. Nordman, J. Vähäkangas, S. Honkanen, N. Peyghambarian

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

Abstract

The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

Original language	English (US)
Pages (from-to)	455-456
Number of pages	2
Journal	Electronics Letters
Volume	34
Issue number	5
DOIs	https://doi.org/10.1049/el:19980368
State	Published - Mar 5 1998

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1049/el:19980368

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title = "Sol-gel hybrid glass diffractive elements by direct electron-beam exposure",

abstract = "The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.",

author = "Rantala, {J. T.} and N. Nordman and O. Nordman and J. V{\"a}h{\"a}kangas and S. Honkanen and N. Peyghambarian",

year = "1998",

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T1 - Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

AU - Rantala, J. T.

AU - Nordman, N.

AU - Nordman, O.

AU - Vähäkangas, J.

AU - Honkanen, S.

AU - Peyghambarian, N.

PY - 1998/3/5

Y1 - 1998/3/5

N2 - The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

AB - The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/ organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings.

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DO - 10.1049/el:19980368

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JO - Electronics Letters

JF - Electronics Letters

IS - 5

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Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

Abstract

ASJC Scopus subject areas

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