Simultaneous determination of thickness and refractive indices of birefringent wafer by simple transmission measurement

Hee Joo Choi, Jun Yeol Ryu, Myoungsik Cha

Research output: Chapter in Book/Report/Conference proceedingConference contribution


We demonstrate a method for determining the principal indices of refraction and the thickness of a birefringent wafer. Simply, the light transmittance was measured while rotating the wafer. The directly transmitted beam makes interference with those multiply reflected between the surfaces as in a Fabry-Pérot etalon, producing an interferogram as a function of angle of incidence. We applied this method to a LiNbO3 wafer, determining the absolute values of ordinary and extraordinary indices with an uncertainty of 10-5. In addition to the measurement accuracy, the major advantages of our method are extreme simplicity and environmental robustness in the experiment.

Original languageEnglish (US)
Title of host publicationInterferometry XVII
Subtitle of host publicationTechniques and Analysis
EditorsKatherine Creath, Jan Burke, Joanna Schmit
ISBN (Electronic)9781628412307
StatePublished - 2014
Externally publishedYes
EventInterferometry XVII: Techniques and Analysis - San Diego, United States
Duration: Aug 17 2014Aug 19 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


OtherInterferometry XVII: Techniques and Analysis
Country/TerritoryUnited States
CitySan Diego


  • Birefringence
  • Index of refraction
  • Interferometer

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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