Abstract
The minimization of sidelobe printability and maximization of latitude and resolution in attenuated phase shift masks (APSM) was studied theoretically and experimentally. The modification of shapes and relative orientations in contact windows was also presented. The results showed the obtaining of sidelobe suppression with no loss in process latitude and resolution.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2896-2899 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 18 |
| Issue number | 6 |
| DOIs | |
| State | Published - Nov 2000 |
| Externally published | Yes |
| Event | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: May 30 2000 → Jun 2 2000 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering
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