Scattering and coherence in EUVL

Tom D. Milster; Neil A. Beaudry

doi:10.1117/12.309613

Scattering and coherence in EUVL

Tom D. Milster, Neil A. Beaudry

Research output: Contribution to journal › Conference article › peer-review

6 Scopus citations

Abstract

We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a Köhler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

Original language	English (US)
Pages (from-to)	537-543
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3331
DOIs	https://doi.org/10.1117/12.309613
State	Published - 1998
Event	Emerging Lithographic Technologies II - Santa Clara, CA, United States Duration: Feb 23 1998 → Feb 25 1998

Keywords

Coherence
Extreme ultraviolet lithography
Scattering

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.309613

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title = "Scattering and coherence in EUVL",

abstract = "We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a K{\"o}hler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.",

keywords = "Coherence, Extreme ultraviolet lithography, Scattering",

author = "Milster, {Tom D.} and Beaudry, {Neil A.}",

year = "1998",

doi = "10.1117/12.309613",

language = "English (US)",

volume = "3331",

pages = "537--543",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Emerging Lithographic Technologies II ; Conference date: 23-02-1998 Through 25-02-1998",

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TY - JOUR

T1 - Scattering and coherence in EUVL

AU - Milster, Tom D.

AU - Beaudry, Neil A.

PY - 1998

Y1 - 1998

N2 - We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a Köhler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

AB - We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant mount of amplitude modulation noise is present in the aerial image if scatter is present in a Köhler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

KW - Coherence

KW - Extreme ultraviolet lithography

KW - Scattering

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U2 - 10.1117/12.309613

DO - 10.1117/12.309613

M3 - Conference article

AN - SCOPUS:0032402857

SN - 0277-786X

VL - 3331

SP - 537

EP - 543

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Emerging Lithographic Technologies II

Y2 - 23 February 1998 through 25 February 1998

ER -

Scattering and coherence in EUVL

Abstract

Keywords

ASJC Scopus subject areas

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