Abstract
Modern high-purity water plants, e.g. in the semiconductor industry, consist of primary purification followed by a polishing loop incorporating a variety of purification stages and techniques. The importance of a systems approach to understanding the competing effects of these processes and the optimization of contaminant control is discussed. Experiments have been performed to investigate the interaction between filtration, UV sterilization, ozone, and ion exchange and the effects on total organics removal (TOC). A simulation model developed from this data can be used in the design and optimization of large systems. (J.M.M.)
Original language | English (US) |
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Pages | 36-37+39-40+42-44 |
Volume | 9 |
No | 6 |
Specialist publication | ULTRAPURE WATER |
State | Published - 1992 |
ASJC Scopus subject areas
- Water Science and Technology
- Fluid Flow and Transfer Processes