Room-temperature si single-electron memory fabricated by nanoimprint lithography

Wei Wu; Jian Gu; Haixiong Ge; Christopher Keimel; Stephen Y. Chou

doi:10.1063/1.1610814

Room-temperature si single-electron memory fabricated by nanoimprint lithography

Wei Wu
, Jian Gu
, Haixiong Ge
, Christopher Keimel
, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

The design, fabrication and characterization of room-temperature Si single-electron memories (SEME) were reported. The nanoimprint lithography (NIL) was used. NIL was shown to be tailored for nanodevice fabrication. It was observed that by using NIL as a nanolithography tool, the single-electron memory was more feasible for mass production.

Original language	English (US)
Pages (from-to)	2268-2270
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	11
DOIs	https://doi.org/10.1063/1.1610814
State	Published - Sep 15 2003
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1610814

Cite this

@article{50b069755c2d487095d3be97ccc9680d,

title = "Room-temperature si single-electron memory fabricated by nanoimprint lithography",

abstract = "The design, fabrication and characterization of room-temperature Si single-electron memories (SEME) were reported. The nanoimprint lithography (NIL) was used. NIL was shown to be tailored for nanodevice fabrication. It was observed that by using NIL as a nanolithography tool, the single-electron memory was more feasible for mass production.",

author = "Wei Wu and Jian Gu and Haixiong Ge and Christopher Keimel and Chou, \{Stephen Y.\}",

year = "2003",

month = sep,

day = "15",

doi = "10.1063/1.1610814",

language = "English (US)",

volume = "83",

pages = "2268--2270",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "11",

}

TY - JOUR

T1 - Room-temperature si single-electron memory fabricated by nanoimprint lithography

AU - Wu, Wei

AU - Gu, Jian

AU - Ge, Haixiong

AU - Keimel, Christopher

AU - Chou, Stephen Y.

PY - 2003/9/15

Y1 - 2003/9/15

N2 - The design, fabrication and characterization of room-temperature Si single-electron memories (SEME) were reported. The nanoimprint lithography (NIL) was used. NIL was shown to be tailored for nanodevice fabrication. It was observed that by using NIL as a nanolithography tool, the single-electron memory was more feasible for mass production.

AB - The design, fabrication and characterization of room-temperature Si single-electron memories (SEME) were reported. The nanoimprint lithography (NIL) was used. NIL was shown to be tailored for nanodevice fabrication. It was observed that by using NIL as a nanolithography tool, the single-electron memory was more feasible for mass production.

UR - https://www.scopus.com/pages/publications/0142026321

UR - https://www.scopus.com/pages/publications/0142026321#tab=citedBy

U2 - 10.1063/1.1610814

DO - 10.1063/1.1610814

M3 - Article

AN - SCOPUS:0142026321

SN - 0003-6951

VL - 83

SP - 2268

EP - 2270

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 11

ER -

Room-temperature si single-electron memory fabricated by nanoimprint lithography

Abstract

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