Rock and roll polishing: A process for optical surface polishing

José M. Sasián; Michael B. North-Morris; Geoffrey L. Wruck; Gregory A. Williby; John E. Greivenkamp

doi:10.1117/1.602316

Rock and roll polishing: A process for optical surface polishing

José M. Sasián
, Michael B. North-Morris
, Geoffrey L. Wruck
, Gregory A. Williby
, John E. Greivenkamp

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

Original language	English (US)
Pages (from-to)	2089-2092
Number of pages	4
Journal	Optical Engineering
Volume	38
Issue number	12
DOIs	https://doi.org/10.1117/1.602316
State	Published - Dec 1999

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Engineering

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title = "Rock and roll polishing: A process for optical surface polishing",

abstract = "The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.",

author = "Sasi{\'a}n, \{Jos{\'e} M.\} and North-Morris, \{Michael B.\} and Wruck, \{Geoffrey L.\} and Williby, \{Gregory A.\} and Greivenkamp, \{John E.\}",

year = "1999",

month = dec,

doi = "10.1117/1.602316",

language = "English (US)",

volume = "38",

pages = "2089--2092",

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T2 - A process for optical surface polishing

AU - Sasián, José M.

AU - North-Morris, Michael B.

AU - Wruck, Geoffrey L.

AU - Williby, Gregory A.

AU - Greivenkamp, John E.

PY - 1999/12

Y1 - 1999/12

N2 - The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

AB - The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

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UR - https://www.scopus.com/pages/publications/0033280748#tab=citedBy

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JO - Optical Engineering

JF - Optical Engineering

IS - 12

ER -

Rock and roll polishing: A process for optical surface polishing

Abstract

ASJC Scopus subject areas

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