The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics