Rock and roll polishing: A process for optical surface polishing

José M. Sasián; Michael B. North-Morris; Geoffrey L. Wruck; Gregory A. Williby; John E. Greivenkamp

doi:10.1117/1.602316

Rock and roll polishing: A process for optical surface polishing

José M. Sasián, Michael B. North-Morris, Geoffrey L. Wruck, Gregory A. Williby, John E. Greivenkamp

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

Original language	English (US)
Pages (from-to)	2089-2092
Number of pages	4
Journal	Optical Engineering
Volume	38
Issue number	12
DOIs	https://doi.org/10.1117/1.602316
State	Published - Dec 1999

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
General Engineering

Access to Document

10.1117/1.602316

Cite this

@article{c9f27a4d6c7b4460bb8dd6826569488d,

title = "Rock and roll polishing: A process for optical surface polishing",

abstract = "The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.",

author = "Sasi{\'a}n, {Jos{\'e} M.} and North-Morris, {Michael B.} and Wruck, {Geoffrey L.} and Williby, {Gregory A.} and Greivenkamp, {John E.}",

year = "1999",

month = dec,

doi = "10.1117/1.602316",

language = "English (US)",

volume = "38",

pages = "2089--2092",

journal = "Optical Engineering",

issn = "0091-3286",

publisher = "SPIE",

number = "12",

}

TY - JOUR

T1 - Rock and roll polishing

T2 - A process for optical surface polishing

AU - Sasián, José M.

AU - North-Morris, Michael B.

AU - Wruck, Geoffrey L.

AU - Williby, Gregory A.

AU - Greivenkamp, John E.

PY - 1999/12

Y1 - 1999/12

N2 - The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

AB - The four important polishing metrics: the uniformity of polishing; the rate material removal; surface microroughness; and subsurface damage; are investigated. It is found that for 25-mm-diam fused silica samples, the average peak-to-valley nonuniformity is of order of 0.1 μm/day, and the removal rate is 1.4 μm/day. The typical surface roughness is 3.5 nm after 3 days, and the subsurface damage is removed in about 3.5 days.

UR - http://www.scopus.com/inward/record.url?scp=0033280748&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033280748&partnerID=8YFLogxK

U2 - 10.1117/1.602316

DO - 10.1117/1.602316

M3 - Article

AN - SCOPUS:0033280748

SN - 0091-3286

VL - 38

SP - 2089

EP - 2092

JO - Optical Engineering

JF - Optical Engineering

IS - 12

ER -

Rock and roll polishing: A process for optical surface polishing

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this