Abstract
We describe an improved implementation of our previously reported common-path, phase shifting, and shearing interferometer. Using a time-multiplexed phase shifting scheme, we demonstrate higher sampling resolution, better light sensitivity, and use of arbitrary phase shifting algorithms. We describe microscopic imaging of the surface profile of a copper-plated silicon wafer and demonstrate that the system is vibration insensitive with ∼λ/100 repeatability. In a more general discussion of our method, we describe the different functional elements and suggest alternative designs and improvements. Possible uses include full-field coherent imaging and high dynamic range wavefront sensing, which we briefly discuss.
Original language | English (US) |
---|---|
Pages (from-to) | B32-B43 |
Journal | Applied optics |
Volume | 47 |
Issue number | 10 |
DOIs | |
State | Published - Apr 1 2008 |
Externally published | Yes |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering