Abstract
Mueller matrix imaging polarimetry was used to study stress in a series of a high numerical aperture molded glass lenses. An interesting radially symmetric retardance was found which resembled the polarization aberration induced by coatings. Upon investigation the source of the polarization aberration is traced to a remarkably symmetric radial stress birefringence in the glass believed to arise during fire-polishing of the surfaces. While annealing the lenses relieves much of the stress birefringence, reducing the retardance of the lenses by a factor of five, the lenses remained unusable for critical polarization applications.
Original language | English (US) |
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Article number | 588809 |
Pages (from-to) | 1-8 |
Number of pages | 8 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 5888 |
DOIs | |
State | Published - 2005 |
Event | Polarization Science and Remote Sensing II - San Diego, CA, United States Duration: Aug 2 2005 → Aug 4 2005 |
Keywords
- Annealing
- Depolarization
- Polarimetry
- Polarization aberration
- Retardance
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering