Reactive sputtering of molybdenum sulfide thin films

Jacob A. Obeng; Glenn L. Schrader

doi:10.1016/0257-8972(94)90196-1

Reactive sputtering of molybdenum sulfide thin films

Jacob A. Obeng
, Glenn L. Schrader

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

MoS_x films have been deposited by r.f. sputtering of an Mo target in an H₂S/Ar atmosphere. Relationships between process conditions and chemical composition, crystalline orientation, and morphology suggest that control of MoS_x film properties are summarized. Preparation of dense, thick MoS_x films with x>1.8 and with preferred "basal" orientation is shown.

Original language	English (US)
Pages (from-to)	422-426
Number of pages	5
Journal	Surface and Coatings Technology
Volume	68-69
Issue number	C
DOIs	https://doi.org/10.1016/0257-8972(94)90196-1
State	Published - Dec 1994
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/0257-8972(94)90196-1

Cite this

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title = "Reactive sputtering of molybdenum sulfide thin films",

abstract = "MoSx films have been deposited by r.f. sputtering of an Mo target in an H2S/Ar atmosphere. Relationships between process conditions and chemical composition, crystalline orientation, and morphology suggest that control of MoSx film properties are summarized. Preparation of dense, thick MoSx films with x>1.8 and with preferred {"}basal{"} orientation is shown.",

author = "Obeng, \{Jacob A.\} and Schrader, \{Glenn L.\}",

year = "1994",

month = dec,

doi = "10.1016/0257-8972(94)90196-1",

language = "English (US)",

volume = "68-69",

pages = "422--426",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "C",

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T1 - Reactive sputtering of molybdenum sulfide thin films

AU - Obeng, Jacob A.

AU - Schrader, Glenn L.

PY - 1994/12

Y1 - 1994/12

N2 - MoSx films have been deposited by r.f. sputtering of an Mo target in an H2S/Ar atmosphere. Relationships between process conditions and chemical composition, crystalline orientation, and morphology suggest that control of MoSx film properties are summarized. Preparation of dense, thick MoSx films with x>1.8 and with preferred "basal" orientation is shown.

AB - MoSx films have been deposited by r.f. sputtering of an Mo target in an H2S/Ar atmosphere. Relationships between process conditions and chemical composition, crystalline orientation, and morphology suggest that control of MoSx film properties are summarized. Preparation of dense, thick MoSx films with x>1.8 and with preferred "basal" orientation is shown.

UR - https://www.scopus.com/pages/publications/0028671105

UR - https://www.scopus.com/pages/publications/0028671105#tab=citedBy

U2 - 10.1016/0257-8972(94)90196-1

DO - 10.1016/0257-8972(94)90196-1

M3 - Article

AN - SCOPUS:0028671105

SN - 0257-8972

VL - 68-69

SP - 422

EP - 426

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - C

ER -

Reactive sputtering of molybdenum sulfide thin films

Abstract

ASJC Scopus subject areas

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