Rapid and accurate measurements of photoresist refractive index dispersion using the prism coupling method

Robert A. Norwood, Lisa A. Whitney

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

A commercially available instrument (Metricon TM 2010) was used to perform refractive index measurements at wavelengths of 543 nm, 632.8 nm and 780 nm on AZ R photoresist and antireflection (AR) coating products. This instrument is computer-controlled and performs all analyses required to determine film indices and thicknesses. The samples were various i-line and g-line photoresists and AR coatings, spun onto silicon at thicknesses of approximately 1 - 2 microns. The reproducibility of the refractive index measurements at different spots on a given sample was found to be very high (usually less than 0.0002) and the time to measure one sample at all the wavelengths was about 15 minutes. The data were fit to a Cauchy function and low error fits were obtained. Most photoresists measured exhibited similar values for the Cauchy coefficients, while BARLi TM had much different coefficients, owing to its large absorption in the visible.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsSusan K. Jones
Pages273-280
Number of pages8
StatePublished - 1996
Externally publishedYes
EventMetrology, Inspection, and Process Control for Microlithography X - Santa Clara, CA, USA
Duration: Mar 11 1996Mar 13 1996

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2725

Other

OtherMetrology, Inspection, and Process Control for Microlithography X
CitySanta Clara, CA, USA
Period3/11/963/13/96

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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