Polarization aberrations induced by graded multilayer coatings in EUV lithography

Thiago S. Jota, Russell A. Chipman

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2016
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580132
StatePublished - 2016
EventOptical Interference Coatings, OIC 2016 - Tucson, United States
Duration: Jun 19 2016Jun 24 2016

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


OtherOptical Interference Coatings, OIC 2016
Country/TerritoryUnited States

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials


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