Polarization aberrations induced by graded multilayer coatings in EUV lithography

Thiago S. Jota; Russell A. Chipman

doi:10.1364/oic.2016.ta.5

Polarization aberrations induced by graded multilayer coatings in EUV lithography

Thiago S. Jota, Russell A. Chipman

Optical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

Original language	English (US)
Title of host publication	Optical Interference Coatings, OIC 2016
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580132
DOIs	https://doi.org/10.1364/oic.2016.ta.5
State	Published - 2016
Event	Optical Interference Coatings, OIC 2016 - Tucson, United States Duration: Jun 19 2016 → Jun 24 2016

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Optical Interference Coatings, OIC 2016
Country/Territory	United States
City	Tucson
Period	6/19/16 → 6/24/16

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

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10.1364/oic.2016.ta.5

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title = "Polarization aberrations induced by graded multilayer coatings in EUV lithography",

abstract = "Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.",

author = "Jota, {Thiago S.} and Chipman, {Russell A.}",

note = "Publisher Copyright: {\textcopyright} OSA 2016.; Optical Interference Coatings, OIC 2016 ; Conference date: 19-06-2016 Through 24-06-2016",

year = "2016",

doi = "10.1364/oic.2016.ta.5",

language = "English (US)",

isbn = "9781943580132",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

booktitle = "Optical Interference Coatings, OIC 2016",

}

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AU - Jota, Thiago S.

AU - Chipman, Russell A.

PY - 2016

Y1 - 2016

N2 - Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

AB - Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

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U2 - 10.1364/oic.2016.ta.5

DO - 10.1364/oic.2016.ta.5

M3 - Conference contribution

AN - SCOPUS:85085405029

SN - 9781943580132

T3 - Optics InfoBase Conference Papers

BT - Optical Interference Coatings, OIC 2016

PB - Optica Publishing Group (formerly OSA)

T2 - Optical Interference Coatings, OIC 2016

Y2 - 19 June 2016 through 24 June 2016

ER -

Polarization aberrations induced by graded multilayer coatings in EUV lithography

Abstract

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