Polarization aberrations induced by graded multilayer coatings in EUV lithography

Thiago S. Jota, Russell A. Chipman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2016
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580132
DOIs
StatePublished - 2016
EventOptical Interference Coatings, OIC 2016 - Tucson, United States
Duration: Jun 19 2016Jun 24 2016

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Interference Coatings, OIC 2016
Country/TerritoryUnited States
CityTucson
Period6/19/166/24/16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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