An overview is given of several features of hybrid inorganic-organic sol-gel for compound semiconductor processing. Hybrid sol-gel films, with dual organic-inorganic properties, can be easily spin-coated and photopatterned on semiconductor substrates and used as the dielectric masking layer for dry etching of semiconductor compounds such as GaAs and InP. Planarization capabilities of the hybrid sol-gels on deep mesas are also demonstrated.
|Number of pages
|Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
|Published - Nov 2002
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering