Abstract
An overview is given of several features of hybrid inorganic-organic sol-gel for compound semiconductor processing. Hybrid sol-gel films, with dual organic-inorganic properties, can be easily spin-coated and photopatterned on semiconductor substrates and used as the dielectric masking layer for dry etching of semiconductor compounds such as GaAs and InP. Planarization capabilities of the hybrid sol-gels on deep mesas are also demonstrated.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2942-2945 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 20 |
| Issue number | 6 |
| DOIs | |
| State | Published - Nov 2002 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering