Patterning magnetic films by ion beam irradiation

B. D. Terris; D. Weller; L. Folks; J. E.E. Baglin; A. J. Kellock; H. Rothuizen; P. Vettiger

doi:10.1063/1.372912

Patterning magnetic films by ion beam irradiation

B. D. Terris, D. Weller, L. Folks, J. E.E. Baglin, A. J. Kellock, H. Rothuizen, P. Vettiger

Research output: Contribution to journal › Conference article › peer-review

81 Scopus citations

Abstract

We have used ion beam irradiation through a silicon stencil mask to alter the magnetic properties of Co/Pt multilayer and FePt chemically-ordered superlattice films. In both systems, ion irradiation disorders the as-grown films which results in a reduction of the magnetic anisotropy. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter. These magnetic structures have been observed by magnetic force microscopy. By stepping the mask during irradiation, features at twice the spatial frequency of the mask holes have been produced. Such patterned magnetic films are of interest for application in high-density magnetic recording.

Original language	English (US)
Pages (from-to)	7004-7006
Number of pages	3
Journal	Journal of Applied Physics
Volume	87
Issue number	9 III
DOIs	https://doi.org/10.1063/1.372912
State	Published - May 1 2000
Externally published	Yes
Event	44th Annual Conference on Magnetism and Magnetic Materials - San Jose, CA, United States Duration: Nov 15 1999 → Nov 18 1999

ASJC Scopus subject areas

General Physics and Astronomy

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10.1063/1.372912

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title = "Patterning magnetic films by ion beam irradiation",

abstract = "We have used ion beam irradiation through a silicon stencil mask to alter the magnetic properties of Co/Pt multilayer and FePt chemically-ordered superlattice films. In both systems, ion irradiation disorders the as-grown films which results in a reduction of the magnetic anisotropy. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter. These magnetic structures have been observed by magnetic force microscopy. By stepping the mask during irradiation, features at twice the spatial frequency of the mask holes have been produced. Such patterned magnetic films are of interest for application in high-density magnetic recording.",

author = "Terris, {B. D.} and D. Weller and L. Folks and Baglin, {J. E.E.} and Kellock, {A. J.} and H. Rothuizen and P. Vettiger",

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note = "44th Annual Conference on Magnetism and Magnetic Materials ; Conference date: 15-11-1999 Through 18-11-1999",

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T1 - Patterning magnetic films by ion beam irradiation

AU - Terris, B. D.

AU - Weller, D.

AU - Folks, L.

AU - Baglin, J. E.E.

AU - Kellock, A. J.

AU - Rothuizen, H.

AU - Vettiger, P.

PY - 2000/5/1

Y1 - 2000/5/1

N2 - We have used ion beam irradiation through a silicon stencil mask to alter the magnetic properties of Co/Pt multilayer and FePt chemically-ordered superlattice films. In both systems, ion irradiation disorders the as-grown films which results in a reduction of the magnetic anisotropy. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter. These magnetic structures have been observed by magnetic force microscopy. By stepping the mask during irradiation, features at twice the spatial frequency of the mask holes have been produced. Such patterned magnetic films are of interest for application in high-density magnetic recording.

AB - We have used ion beam irradiation through a silicon stencil mask to alter the magnetic properties of Co/Pt multilayer and FePt chemically-ordered superlattice films. In both systems, ion irradiation disorders the as-grown films which results in a reduction of the magnetic anisotropy. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter. These magnetic structures have been observed by magnetic force microscopy. By stepping the mask during irradiation, features at twice the spatial frequency of the mask holes have been produced. Such patterned magnetic films are of interest for application in high-density magnetic recording.

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DO - 10.1063/1.372912

M3 - Conference article

AN - SCOPUS:0000959458

SN - 0021-8979

VL - 87

SP - 7004

EP - 7006

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9 III

T2 - 44th Annual Conference on Magnetism and Magnetic Materials

Y2 - 15 November 1999 through 18 November 1999

ER -

Patterning magnetic films by ion beam irradiation

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