Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

W. G. Wang; A. Pearse; M. Li; S. Hageman; A. X. Chen; F. Q. Zhu; C. L. Chien

doi:10.1038/srep01948

Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

W. G. Wang, A. Pearse, M. Li, S. Hageman, A. X. Chen, F. Q. Zhu, C. L. Chien

Physics

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12 Scopus citations

Abstract

We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.

Original language	English (US)
Article number	1948
Journal	Scientific reports
Volume	3
DOIs	https://doi.org/10.1038/srep01948
State	Published - Jun 6 2013

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@article{a397a1c67e714029a0370454f43d483c,

title = "Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography",

abstract = "We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.",

author = "Wang, {W. G.} and A. Pearse and M. Li and S. Hageman and Chen, {A. X.} and Zhu, {F. Q.} and Chien, {C. L.}",

note = "Funding Information: The authors would like to thank N. Vogel for generously providing us with nanosphere solutions and very helpful discussion. This work is supported by NSF DMR05-20491.",

year = "2013",

month = jun,

day = "6",

doi = "10.1038/srep01948",

language = "English (US)",

volume = "3",

journal = "Scientific Reports",

issn = "2045-2322",

publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

AU - Wang, W. G.

AU - Pearse, A.

AU - Li, M.

AU - Hageman, S.

AU - Chen, A. X.

AU - Zhu, F. Q.

AU - Chien, C. L.

N1 - Funding Information: The authors would like to thank N. Vogel for generously providing us with nanosphere solutions and very helpful discussion. This work is supported by NSF DMR05-20491.

PY - 2013/6/6

Y1 - 2013/6/6

N2 - We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.

AB - We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.

UR - http://www.scopus.com/inward/record.url?scp=84901781349&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84901781349&partnerID=8YFLogxK

U2 - 10.1038/srep01948

DO - 10.1038/srep01948

M3 - Article

AN - SCOPUS:84901781349

VL - 3

JO - Scientific Reports

JF - Scientific Reports

SN - 2045-2322

M1 - 1948

ER -

Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

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