Oxide powders for chemical mechanical polishing produced by chemical vapor synthesis

H. Sieger; M. Winterer; U. Keiderling; H. Hahn

doi:10.1557/proc-671-m2.5

Oxide powders for chemical mechanical polishing produced by chemical vapor synthesis

H. Sieger
, M. Winterer
, U. Keiderling
, H. Hahn

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

Ultrafine silica, alumina and doped alumina/silica powders have been produced by Chemical Vapor Synthesis (CVS). Primary particle sizes from 3.5 to 12.4 nm have been achieved. Agglomerate sizes ranging from approx. 10 to 150 nm have been achieved in aqueous dispersions.

Original language	English (US)
Pages (from-to)	M2.5.1-M2.5.5
Journal	Materials Research Society Symposium - Proceedings
Volume	671
DOIs	https://doi.org/10.1557/proc-671-m2.5
State	Published - 2001
Externally published	Yes
Event	Chemical - Mechanical Polishing 2001 - Advances and Future Challenges - San Francisco, CA, United States Duration: Apr 18 2001 → Apr 20 2001

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-671-m2.5

Cite this

@article{fd8173d3f8fc45dca2c3b08c61e41326,

title = "Oxide powders for chemical mechanical polishing produced by chemical vapor synthesis",

abstract = "Ultrafine silica, alumina and doped alumina/silica powders have been produced by Chemical Vapor Synthesis (CVS). Primary particle sizes from 3.5 to 12.4 nm have been achieved. Agglomerate sizes ranging from approx. 10 to 150 nm have been achieved in aqueous dispersions.",

author = "H. Sieger and M. Winterer and U. Keiderling and H. Hahn",

year = "2001",

doi = "10.1557/proc-671-m2.5",

language = "English (US)",

volume = "671",

pages = "M2.5.1--M2.5.5",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Chemical - Mechanical Polishing 2001 - Advances and Future Challenges ; Conference date: 18-04-2001 Through 20-04-2001",

}

TY - JOUR

T1 - Oxide powders for chemical mechanical polishing produced by chemical vapor synthesis

AU - Sieger, H.

AU - Winterer, M.

AU - Keiderling, U.

AU - Hahn, H.

PY - 2001

Y1 - 2001

N2 - Ultrafine silica, alumina and doped alumina/silica powders have been produced by Chemical Vapor Synthesis (CVS). Primary particle sizes from 3.5 to 12.4 nm have been achieved. Agglomerate sizes ranging from approx. 10 to 150 nm have been achieved in aqueous dispersions.

AB - Ultrafine silica, alumina and doped alumina/silica powders have been produced by Chemical Vapor Synthesis (CVS). Primary particle sizes from 3.5 to 12.4 nm have been achieved. Agglomerate sizes ranging from approx. 10 to 150 nm have been achieved in aqueous dispersions.

UR - https://www.scopus.com/pages/publications/0035558801

UR - https://www.scopus.com/pages/publications/0035558801#tab=citedBy

U2 - 10.1557/proc-671-m2.5

DO - 10.1557/proc-671-m2.5

M3 - Conference article

AN - SCOPUS:0035558801

SN - 0272-9172

VL - 671

SP - M2.5.1-M2.5.5

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Chemical - Mechanical Polishing 2001 - Advances and Future Challenges

Y2 - 18 April 2001 through 20 April 2001

ER -

Oxide powders for chemical mechanical polishing produced by chemical vapor synthesis

Abstract

ASJC Scopus subject areas

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