@inproceedings{97d05435268742339644effa590e9e3c,
title = "Optomechanical design and tolerance of a microscope objective at 121.6 nm",
abstract = "By utilizing the Hydrogen-Lyman-α (HLA) source at 121.6 nm, we hope to achieve an intrinsic resolution of 247 nm at 0.3 numerical aperture (NA) and 92 nm at 0.8 NA. The motivation for 121.6 nm microscopy is the existence of a transparent window in the air absorption spectrum at that wavelength, which allows for the sample to be in air while the microscope is in an enclosed nitrogen environment. The microscope objective consists of two reflective optics and a LiF window, and it has been designed to demonstrate diffraction limited performance over a 160 μm full field at 121.6 nm. The optomechanical design consists of mechanical subcells for each optical component, precision spacers and a barrel bore, which allow for submicron control of tolerance parameters.",
keywords = "Hydrogen-Lyman-α, Microscopy, Optical alignment, Optomechanics, Vacuum ultraviolet",
author = "Keyes, {Derek S.} and Jota, {Thiago S.} and Weichuan Gao and Dakota Luepke and Victor Densmore and Kim, {Young Sik} and Kim, {Gun Hee} and Milster, {Thomas D.}",
note = "Publisher Copyright: {\textcopyright} 2015 SPIE.; Optical Manufacturing and Testing XI ; Conference date: 09-08-2015 Through 11-08-2015",
year = "2015",
doi = "10.1117/12.2188803",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Ray Williamson and Fahnle, {Oliver W.} and Kim, {Dae Wook}",
booktitle = "Optical Manufacturing and Testing XI",
}