Optically defined multifunctional patterning of photosensitive thin-film silica mesophases

Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed sitoxane condensation, which can be used for selective etching of unexposed regions; for 'gray-scale' patterning of refractive index, pore size, surface area, and wetting behavior, and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.