Optical metrology systems spanning the full spatial frequency spectrum

Dae Wook Kim, Maham Aftab, Heejoo Choi, Logan Graves, Isaac Trumper

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

We present a collection of unique, collaborative, optical metrology systems that are fully capable of measuring the extensive spectrum of low-to-mid-to-high spatial frequencies, corresponding to surface shape information.

Original languageEnglish (US)
Title of host publicationFrontiers in Optics, FiO 2016
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580194
DOIs
StatePublished - 2016
EventFrontiers in Optics, FiO 2016 - Rochester, United States
Duration: Oct 17 2016Oct 21 2016

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherFrontiers in Optics, FiO 2016
Country/TerritoryUnited States
CityRochester
Period10/17/1610/21/16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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