@inproceedings{072018b4bf844663b3eb7d0d235721d6,
title = "Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography",
abstract = "We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.",
keywords = "CMOS compatible, hybrid lithography, mask-based lithography, mask-less lithography, optical characterization",
author = "Sunglin Wang and Chris Summitt and Lee Johnson and Melissa Zaverton and Tom Milster and Yuzuru Takashima",
note = "Publisher Copyright: {\textcopyright} 2014 SPIE.; Nanoengineering: Fabrication, Properties, Optics, and Devices XI ; Conference date: 19-08-2014 Through 20-08-2014",
year = "2014",
doi = "10.1117/12.2062414",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Dobisz, {Elizabeth A.} and Campo, {Eva M.} and Eldada, {Louay A.}",
booktitle = "Nanoengineering",
}