TY - JOUR
T1 - On-wafer measurement of microstrip-based circuits with a broadband vialess transition
AU - Zhu, Lin
AU - Melde, Kathleen L.
N1 - Funding Information:
Manuscript received November 10, 2004; revised July 6, 2005. This work was supported in part by the Semiconductor Research Corporation under Contract 2001.NJ.950.
PY - 2006/8
Y1 - 2006/8
N2 - A broadband vialess coplanar waveguide (CPW)-to-microstrip transition for on-wafer measurements has been developed. The electrical connection between the top ground of the CPW and the bottom ground of the microstrip is realized by electromagnetic coupling, thus no substrate via holes are required. In this paper, simulation and measurement results of the transition are given, the optimal design rules are discussed, and the utilization of the transition for de-embedding microstrip benchmark structures is presented. The measured insertion loss of two transitions in a back-to-back configuration is less than 0.5 dB from 2.5 to 11.8 GHz, and the measured return loss is better than 20 dB from 3 to 11 GHz.
AB - A broadband vialess coplanar waveguide (CPW)-to-microstrip transition for on-wafer measurements has been developed. The electrical connection between the top ground of the CPW and the bottom ground of the microstrip is realized by electromagnetic coupling, thus no substrate via holes are required. In this paper, simulation and measurement results of the transition are given, the optimal design rules are discussed, and the utilization of the transition for de-embedding microstrip benchmark structures is presented. The measured insertion loss of two transitions in a back-to-back configuration is less than 0.5 dB from 2.5 to 11.8 GHz, and the measured return loss is better than 20 dB from 3 to 11 GHz.
KW - Coplanar waveguide (CPW)-to-microstrip transition
KW - Microstrip on-wafer measurement
KW - Multiline thru-reflect-line (ML-TRL) calibration
KW - Vialess
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U2 - 10.1109/TADVP.2006.875093
DO - 10.1109/TADVP.2006.875093
M3 - Article
AN - SCOPUS:33747601388
SN - 1521-3323
VL - 29
SP - 654
EP - 659
JO - IEEE Transactions on Advanced Packaging
JF - IEEE Transactions on Advanced Packaging
IS - 3
ER -