On-machine metrology for diamond turning applications

Wenjun Kang, Yihan Wang, Hongzhang Ma, Daodang Wang, Rongguang Liang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A dual-mode on-machine metrology system has been developed to address the critical demand for on-machine metrology in precision optics fabrication. The system can measure both surface form and roughness simultaneously, without requiring the reconfiguration of the optical path to switch between laser interferometer mode and LED interference microscopy mode. It can achieve snapshot high-precision phase-shifting measurement, minimizing the impact of environmental disturbance. With its compact design, the system makes on-machine metrology feasible in diamond turning machines, avoiding errors caused by removing, repositioning, and balancing the workpiece. With the compact and dual-mode features, it makes on-machine tool alignment and surface characterization possible, avoiding off-line testing and significantly increasing process efficiency.

Original languageEnglish (US)
Title of host publicationApplied Optical Metrology V
EditorsErik Novak, Christopher C. Wilcox
PublisherSPIE
ISBN (Electronic)9781510665583
DOIs
StatePublished - 2023
EventApplied Optical Metrology V 2023 - San Diego, United States
Duration: Aug 22 2023Aug 23 2023

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12672
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceApplied Optical Metrology V 2023
Country/TerritoryUnited States
CitySan Diego
Period8/22/238/23/23

Keywords

  • On-machine metrology
  • diamond turning
  • dual-mode
  • interferometer

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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