@inproceedings{1b5c06710771454d88f72009e5581da4,
title = "Novel slurry injection system for improved slurry flow and reduced defects in CMP",
keywords = "CMP, COO, Foam, Pad debris, Slurry flow, Slurry injection system, Wafer-level defects",
author = "Ara Philipossian and Len Borucki and Yasa Sampurno and Yun Zhuang",
year = "2015",
doi = "10.4028/www.scientific.net/SSP.219.143",
language = "English (US)",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "143--147",
editor = "Mertens, {Paul W.} and Marc Meuris and Marc Heyns and Marc Meuris and Marc Heyns",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces XII",
note = "12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 ; Conference date: 21-09-2014 Through 24-09-2014",
}