NIR high-efficiency subwavelength diffractive structures in semiconductors

Robert E. Smith, Mial E. Warren, Joel R. Wendt, Gregory A. Vawter

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have fabricated sub-wavelength diffractive optical elements with binary phase profiles for operation at 975 nm. Blazed transmission gratings with minimum features 63 nm wide were designed by using rigorous coupled-wave analysis and fabricated by direct-write e-beam lithography and reactive ion beam etching in gallium arsenide. Transmission measurements show 85% diffraction efficiency into the first order. Anti-reflection surfaces, with features 42 nm wide were also designed and fabricated.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages122-128
Number of pages7
ISBN (Print)0819417513
StatePublished - 1995
Externally publishedYes
EventDiffractive and Holographic Optics Technology II - San Jose, CA, USA
Duration: Feb 9 1995Feb 10 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2404
ISSN (Print)0277-786X

Conference

ConferenceDiffractive and Holographic Optics Technology II
CitySan Jose, CA, USA
Period2/9/952/10/95

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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